Substrate structure and method for forming patterned layer on the same
AssigneeIcf Technology Limited.
InventorCHING-YU CHOU
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Abstract
A substrate structure includes a substrate and a plurality of unitary layer partition walls with ink repellent characteristic provided on and connected with the substrate, the partition walls cooperatively defining a plurality of separated first accommodating rooms configured for containing ink therein, at least one of the partition walls includes at least a second accommodating room configured for receiving excessive amount of ink overflowing from the first accommodating rooms. A method for manufacturing a patterned layer includes the steps of: preparing a substrate structure; applying ink into first accommodating rooms; solidifying the ink in the first accommodating rooms to form a patterned layer on the substrate structure.
Claims15
A substrate structure, comprising:
- a substrate;
- a plurality of unitary layer partition walls with ink repellent characteristic provided on and connected with the substrate, the partition walls cooperatively defining a plurality of separated first accommodating rooms configured for containing ink therein, at least one of the partition walls includes at least a second accommodating room configured for receiving excess amount of ink overflowing from the first accommodating rooms;
- a patterned layer formed in the first accommodating rooms.
Dependencies are inferred from the claim text.