Method for imprint lithography at constant temperature
AssigneeObducat AB
InventorsMarc Beck, Babak Heidari, Erik Bolmsjo
Life of this patent
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Abstract
Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.
Claims23
Method for transferring a pattern from a template having a structured surface to a substrate carrying a surface layer of a material devised to solidify upon exposure to radiation, comprising:
- arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer;
- heating the template and the substrate to a temperature Tp by means of a heater device;
- and
- while maintaining said temperature Tp, performing the steps of:
- pressing the template towards the substrate for imprinting said pattern into said layer;
- exposing said layer to radiation for solidifying the layer, and
- postbaking the layer.
Dependencies are inferred from the claim text.