Area-efficient gated diode structure and method of forming same
AssigneeInternational Business Machines Corporation
InventorsLeland Chang, Robert Dennard, David Fried, Wing Luk
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AssigneeInternational Business Machines Corporation
InventorsLeland Chang, Robert Dennard, David Fried, Wing Luk
Estimating the term…
An area-efficient gated diode includes a semiconductor layer of a first conductivity type, an active region of a second conductivity type formed in the semiconductor layer proximate an upper surface of the semiconductor layer, and at least one trench electrode extending substantially vertically through the active region and at least partially into the semiconductor layer. A first terminal of the gated diode is electrically connected to the trench electrode, and at least a second terminal is electrically connected to the active region. The gated diode is operative in one of at least a first mode and a second mode as a function of a voltage potential applied between the first and second terminals. The first mode is characterized by the creation of an inversion layer in the semiconductor layer substantially surrounding the trench electrode. The gated diode has a first capacitance in the first mode and a second capacitance in the second mode, the first capacitance being substantially greater than the second capacitance.
A gated diode structure, comprising:
An integrated circuit comprising at least one gated diode, the at least one gated diode comprising:
A method of forming a gated diode, the method comprising the steps of:
Dependencies are inferred from the claim text.