Conformable Contact Masking Methods and Apparatus Utilizing In Situ Cathodic Activation of a Substrate

An electrochemical fabrication process for producing a three-dimensional structure from a plurality of adhered layers, the process comprising:

• (A) supplying at least one material to be deposited, wherein the at least one material has an effective deposition voltage that is higher than an open circuit voltage, and wherein a deposition control parameter is capable of being set to such a value that a voltage can be controlled to a value between the effective deposition voltage and the open circuit voltage such that no significant deposition occurs but such that surface activation of at least a portion of a previously formed layer can occur;
• and
• (B) forming a plurality of layers by depositing one or more materials which include the at least one material, wherein each successive layer is formed adjacent to and adhered to a previously formed layer to produce a three-dimensional structure from a plurality of adhered layers,
• wherein during the formation of at least some of the plurality of layers, making electrical contact between an anode and the previously formed layer via a plating solution,
• wherein after making electrical contact between the anode and the previously formed layer, setting the deposition control parameter to at least one value and for a time such that at least the portion of the previously formed layer, comprising the at least one material, is activated without any significant deposition occurring and thereafter applying a current between the anode and the previously formed layer such that deposition of the at least one material occurs,
• wherein the depositing of the at least one material or a depositing of at least one other material during formation of more than one layer of the plurality of layers comprises:
• (1) contacting or placing in proximity the previously formed layer and a patterned preformed contact mask having at least one opening;
• (2) in the presence of a plating solution, conducting an electric current between an anode and the previously formed layer, which functions as a cathode, through the at least one opening in the mask, such that one of the at least one deposition material or the other deposition material is deposited onto the previously formed layer to form at least a portion of the successive layer, after which the mask is removed from the previously formed layer.

An electrochemical fabrication process for producing a three-dimensional structure from a plurality of adhered layers, the process comprising:

• forming a plurality of successive layers, wherein each successive layer is formed from the deposition of one or more materials, and wherein each successive layer is formed adjacent to and adhered to an immediately preceding layer, wherein forming each of at least a portion of the plurality of successive layers comprises:
• (A) contacting an immediately preceding layer and a preformed patterned contact mask having at least one opening;
• (B) in the presence of a plating solution, conducting an electric current between an anode and the immediately preceding layer through the at least one opening in the mask, such that a first material is deposited onto the immediately preceding layer to form at least a portion of a successive layer;
• and
• (C) separating the mask from the immediately preceding layer;
• and
• wherein for one or more of the plurality of layers, the forming of the successive layer comprises, in the presence of the plating solution, applying a current between an activation anode and at least a portion of the immediately preceding layer, at such a level and for such a time that at least partial activation of at least a portion of a surface of the immediately preceding layer, comprising at least one of the one or more materials, occurs without significant deposition of any material occurring, and then without separating the immediately preceding layer and the plating solution, applying a current between a deposition anode and the immediately preceding layer at such a level so as to cause deposition of the at least one of the one or more materials.