Method of manufacturing insulating target material
AssigneeSeiko Epson Corporation
InventorsKoji Ohashi, Takeshi Kijima, Setsuya Iwashita, Yasuaki Hamada
Life of this patent
Estimating the term…
Loading patent…
AssigneeSeiko Epson Corporation
InventorsKoji Ohashi, Takeshi Kijima, Setsuya Iwashita, Yasuaki Hamada
Estimating the term…
A method of manufacturing an insulating target material for obtaining an insulating complex oxide film of a general formula AB1-xCxO3, the method including: mixing an oxide of an element A, an oxide of an element B, and an oxide of an element C, subjecting the mixed powder to heat treatment, and pulverizing the resulting product to obtain a first powder; mixing the first powder and a solution including at least one of an Si raw material and a Ge raw material and obtaining a second powder from the mixture of the first powder and the solution; subjecting the second powder to heat treatment and pulverizing the resulting product to obtain a third powder; and subjecting the third powder to heat treatment.
A method of manufacturing an insulating target material for obtaining an insulating complex oxide film of a general formula AB1-xCxO3, the method comprising:
Dependencies are inferred from the claim text.