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US 2007/0163873 A1Published application
Target material and its use in a sputter process
OwnerGerd Kleideiter, Anton Zmelty +1inventors
InventorsGerd Kleideiter, Anton Zmelty, Michael Geisler
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Abstract
The invention relates to a target material for the production of a protective layer for a solar control and absorption layer by means of sputtering. This target material is comprised of silicon doped with titanium. The protective layer, which can be produced with the target material, is heatable without significant changes of its properties. It is therefore also suitable for coating lass, which is heated and subsequently bent.
Claims18
1-16. (canceled)
A target material comprising silicon and between 0.5 and 50 percent by weight titanium.
Dependencies are inferred from the claim text.