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OwnerShinichi Ikeda, Norio Umeyama +3inventors
InventorsShinichi Ikeda, Norio Umeyama, Ariyoshi Ogasawara, Hideo Abe, Yasuhito Tanaka
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A hydrogen permeation membrane that selectively allows the passage of hydrogen and that can be formed in a desired shape is obtained by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2,6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300° C. or higher is obtained in a sintering process at temperature of 200° C. to 500° C., thereby providing a hydrogen or helium permeation membrane that has excellent water resistance. Similarly, a hydrogen or helium storage membrane that selectively stores hydrogen and that can be formed in a desired shape can be formed by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2,6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300° C. or higher is obtained in a sintering process at temperature of 200° C. to 500° C., thereby providing a hydrogen or helium storage membrane that has excellent water resistance.
A hydrogen or helium permeation membrane comprising a silicon resin that includes at least one of phenylheptamethylcyclotetrasiloxane and 2,6-cis-diphenylhexamethylcyclotetrasiloxane.
A method for forming a hydrogen or helium permeation membrane comprising the steps of:
A hydrogen or helium storage membrane comprising a silicon resin that includes at least one of phenylheptamethylcyclotetrasiloxane and 2,6-cis-diphenylhexamethylcyclotetrasiloxane.
A method for forming a hydrogen or helium storage membrane comprising the steps of:
Dependencies are inferred from the claim text.