Apparatus and method for supplying chemicals
AssigneeFujitsu Limited
InventorsNaoki Hiraoka, Takeshi Hiraide
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Abstract
A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a precessing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
Claims18
A method of producing a semiconductor device comprising:
- preparing a first batch of a slurry in a first tank;
- polishing a first wafer with the slurry of the first batch in a CMP processing unit;
- and
- starting preparation of a second batch of the slurry in a second tank when a liquid level of the slurry in the first tank reaches a first predetermined value.
A method for producing a semiconductor device comprising:
- preparing the first batch of a slurry in a first tank;
- polishing a first wafer with the slurry of the first batch in at least one of a plurality of CMP processing units;
- and
- starting preparation of a second batch of the slurry in a second tank when a liquid level of the slurry in the first tank reaches a first predetermined value.
A method of producing a semiconductor device comprising:
- preparing a first batch of a slurry in a first tank;
- supplying the slurry of the first batch to a CMP processing unit to polish at least one of a plurality of wafers;
- and
- starting preparation of a second batch of the slurry in a second tank when a liquid level of the slurry in the first tank reaches a first predetermined value.
Dependencies are inferred from the claim text.