Substrate processing apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsKoji Kaneyama, Kazuhito Shigemori, Akiko Harumoto, Tadashi Miyagi
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Abstract
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. These blocks are arranged in the substrate processing apparatus in the above order. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. A hydrophobic processing unit is arranged in the resist cover film processing block and applies hydrophobic processing to the substrate before exposure processing.
Claims16
A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:
- a processing section for applying processing to a substrate;
- and
- an interface that is provided adjacent to an end of said processing section for exchanging the substrate between said processing section and said exposure device, wherein
- said processing section includes
- a photosensitive film formation unit that forms a photosensitive film made of a photosensitive material on the substrate before exposure processing by said exposure device, and
- a hydrophobic processing unit that applies hydrophobic processing to the substrate after formation of said photosensitive film by said photosensitive film formation unit and before exposure processing by said exposure device.
Dependencies are inferred from the claim text.