Process for producing transparent electrode
AssigneeAsahi Glass Company, Limited
InventorsAkira Mitsui, Hidefumi Odaka, Shigeaki Yonemori, Yasuhiko Akao
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Abstract
To provide a process for producing a transparent electrode comprising a tin oxide film which can readily be patterned, which can be realized at a low cost, and which has low resistivity and is excellent in transparency. A process for producing a transparent electrode having a patterned tin oxide film formed on a substrate, which comprises a step of forming a tin oxide film having light absorption characteristics on a substrate, a patterning step of removing part of the tin oxide film having light absorption characteristics, and a step of subjecting the patterned tin oxide film having light absorption characteristics to heat treatment to obtain a tin oxide film.
Claims42
A process for producing a transparent electrode having a patterned tin oxide film formed on a substrate, which comprises a step of forming a tin oxide film having light absorption characteristics on a substrate, a patterning step of removing part of the tin oxide film having light absorption characteristics, and a step of subjecting the patterned tin oxide film having light absorption characteristics to heat treatment to obtain a tin oxide film.
A process for producing a transparent electrode having a patterned tin oxide film formed on a substrate, which comprises a step of forming a SnO2-x (0.3≦x≦1.95) film on a substrate, a patterning step of removing part of the SnO2-x film, and a step of subjecting the patterned SnO2-x film to heat treatment to obtain a tin oxide film.
A process for producing a transparent electrode having a patterned tin oxide film formed on a substrate, which comprises a step of forming a tin oxide film having a density of at most 6.5 g/cm3 on a substrate, a patterning step of removing part of the tin oxide film having a density of at most 6.5 g/cm3, and a step of subjecting the patterned tin oxide film having a density of at most 6.5 g/cm3 to heat treatment to obtain a tin oxide film.
A film capable of being patterned and forming a patterned tin oxide film on a substrate, which is a tin oxide film having light absorbing characteristics.
A film capable of being patterned and forming a patterned tin oxide film on a substrate, which is a SnO2-x (0.3≦x≦1.95) film.
A film capable of being patterned and forming a patterned tin oxide film on a substrate, which is a tin oxide film having a density of at most 6.5 g/cm3.
Dependencies are inferred from the claim text.