Substrate processing apparatus, substrate processing method, and substrate holding apparatus

A substrate processing apparatus comprising:

• a substrate holder for holding and rotating a substrate;
• a first gas supply nozzle and a second gas supply nozzle disposed above and below the substrate, respectively, for supplying a gas to the substrate;
• a first liquid supply nozzle and a second liquid supply nozzle disposed above and below the substrate, respectively, for supplying a liquid to the substrate;
• a first moving mechanism for moving said first gas supply nozzle and said first liquid supply nozzle from a central portion to a peripheral portion of the substrate;
• and
• a second moving mechanism for moving said second gas supply nozzle and said second liquid supply nozzle from the central portion to the peripheral portion of the substrate;
• wherein said first liquid supply nozzle is disposed outwardly of said first gas supply nozzle in a radial direction of the substrate, and said second liquid supply nozzle is disposed outwardly of said second gas supply nozzle in the radial direction of the substrate.

A substrate processing method comprising:

• rotating a substrate by a substrate holder;
• supplying a fluid to the substrate which is being rotated;
• and
• sucking the fluid, which has been moved from the substrate to said substrate holder, through a holder suction unit disposed closely to said substrate holder.

A substrate processing method comprising:

• bringing a substrate holder into contact with an edge portion of a substrate so as to hold and rotate the substrate;
• supplying a fluid to the substrate which is being rotated by said substrate holder;
• supplying a drying gas to the substrate from a gas supply nozzle;
• moving said gas supply nozzle from a central portion to a peripheral portion of the substrate while supplying the drying gas to the substrate so as to move the fluid on the substrate to the peripheral portion of the substrate;
• and
• sucking the fluid, which has been moved from the peripheral portion of the substrate to said substrate holder, through a holder suction unit disposed closely to said substrate holder.

A substrate processing method comprising:

• rotating the substrate by a substrate holder;
• supplying a liquid from at least one of a first liquid supply nozzle and a second liquid supply nozzle disposed above and below the substrate, respectively, to a portion located radially outwardly of a central portion of the substrate;
• supplying a gas from a first gas supply nozzle and a second gas supply nozzle disposed above and below the substrate, respectively, to the central portion of the substrate;
• moving said first liquid supply nozzle and said first gas supply nozzle from the central portion to the peripheral portion of the substrate so as to dry an upper surface of the substrate;
• and
• moving said second liquid supply nozzle and said second gas supply nozzle from the central portion to the peripheral portion of the substrate so as to dry a lower surface of the substrate.

A substrate processing apparatus comprising:

• a substrate holder for holding and rotating a substrate;
• at least one fluid supply port for supplying a fluid to the substrate which is being rotated;
• and
• at least one fluid suction port for sucking the fluid on the substrate;
• wherein said fluid supply port and said fluid suction port are disposed closely to the substrate.

A substrate processing method, comprising:

• rotating a substrate;
• supplying a fluid from at least one fluid supply port to the substrate which is being rotated;
• and
• sucking the fluid on the substrate through at least one fluid suction port;
• wherein said fluid supply port and said fluid suction port are disposed closely to the substrate.

A substrate holding apparatus comprising:

• a plurality of rollers which are brought into contact with an edge portion of a substrate so as to hold and rotate the substrate;
• and
• at least one moving mechanism for moving said rollers;
• wherein said rollers are moved in a radial direction of the substrate.