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AssigneeThe Regents of the University of CA
InventorsStefan Hau-Riege, Donald Sweeney, Anton Barty, Paul Mirkarimi, Daniel Stearns
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A method for repairing mask-blank defects uses repair-zone compensation. Local disturbances are compensated over the post-defect-repair repair-zone by altering a portion of the absorber pattern on the surface of the mask blank. This enables the fabrication of defect-free (since repaired) X-ray Mo—Si multilayer mirrors. Repairing Mo—Si multilayer-film defects on mask blanks is a key for the commercial success of EUVL. It is known that particles are added to the Mo—Si multilayer film during the fabrication process. There is a large effort to reduce this contamination, but results are not sufficient, and defects continue to be a major mask yield limiter.
A method for compensating for defect-repair-induced residual variation of optical properties across a mask blank repair zone, the method comprising altering a portion of an absorber pattern on a surface of said mask blank in proximity to said repair zone to compensate for a local disturbance of an electro-magnetic field induced by said repair zone.
A method, comprising:
A method comprising compensating for a reflectance variation in mask blank, wherein said reflectance variation is a residual effect from performing a defect repair technique on said mask blank, wherein the step of compensating for a reflectance variation comprises altering a portion of an absorber pattern on the surface of said mask blank.
Dependencies are inferred from the claim text.