Phase-change optical recording medium
AssigneeKabushiki Kaisha Toshiba
InventorsTsukasa Nakai, Sumio Ashida, Keiichiro Yusu, Takayuki Tsukamoto, Noritake Oomachi, Naomasa Nakamura, Katsutaro Ichihara
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Abstract
A phase-change optical recording medium has a phase-change recording film to which recording and erasure can be reversibly performed by irradiation with light, and at least one dielectric film formed of a SiOC film containing Si, O and C, and having a carbon concentration within a range of between 0.1 and 30 atomic %.
Claims15
A method for manufacturing a phase-change optical recording medium, comprising a phase-change recording film to which recording and erasure can be reversibly performed by irradiation with light and at least one dielectric film, the method comprising:
- preparing a SiC target or a mixed target of Si and SiC to form at least one dielectric film;
- and
- depositing a SiOC film containing Si, O and C, and having a carbon concentration within a range of between 0.1 and 30 atomic % by DC sputtering in a gas containing Ar and O2.
Dependencies are inferred from the claim text.