Illumination system particularly for microlithography

An illumination system, particularly for microlithography with wavelengths≦193 nm, comprising:

• a primary light source (6501, 7501, 8401);
• a first optical component;
• a second optical component (6521, 7221, 7521, 8421);
• an image plane (6529, 7229, 7529, 8429);
• and
• an exit pupil (6533, 7233, 7533);
• wherein said first optical component transforms said primary light source (6501, 7501, 8401) into a plurality of secondary light sources (6507, 7207, 7507) that are imaged by said second optical component (6521, 7221, 7521, 8421) in said exit pupil (6533, 7233, 7533),
• wherein said first optical component includes a first optical element having a plurality of first raster elements (6509, 7209, 7309, 7309, 8409), that are imaged into said image plane (6529, 7229, 7529, 8429) producing a plurality of images being superimposed at least partially on a field in said image plane (6529, 7229, 7529, 8429),
• wherein said first raster elements (6509, 7209, 7309, 7309, 8409) that are imaged into the image plane (6529, 7229, 7529, 8429) are illuminated almost completely.