Metal line structure of optical scanner and method of fabricating the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHyun-ku Jeong, Won-joo Kim, Young-chul Ko
Life of this patent
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Abstract
A metal line structure of an optical scanner and a method of fabricating the same are provided. The metal line structure of the optical scanner includes: a glass substrate having a metal line region etched to a predetermined depth; a metal line formed in the metal line region; a diffusion barrier layer that is formed on the glass substrate and covers the metal line; and an optical scanner structure combined with the glass substrate.
Claims8
A metal line structure of an optical scanner comprising:
- a glass substrate having a metal line region etched to a predetermined depth;
- a metal line formed in the metal line region;
- a diffusion barrier layer that is formed on the glass substrate and covers the metal line;
- and
- an optical scanner structure combined with the glass substrate.
The metal line structure of the optical scanner of 1, wherein the diffusion barrier layer is formed to a thickness of about 500-2000 Å.
A method of fabricating a metal line structure of an optical scanner, the method comprising:
- patterning a metal line region on a glass substrate to a predetermined depth;
- forming a metal line in the metal line region;
- forming a diffusion barrier layer that covers the metal line, on the glass substrate;
- and
- anodic bonding an optical scanner structure having a lower portion formed of silicon to the glass substrate.
Dependencies are inferred from the claim text.