Method and apparatus for forming a surface-relief hologram mask

A method for manufacturing a surface-relief hologram mask for use on a lithographic system based on TIR holography which comprises the steps of:

• i) providing a master hologram mask comprising a volume hologram of a pattern of features recorded on a first substrate using a TIR holographic recording system and a volume holographic recording material, and wherein the volume hologram includes a transmission image hologram and a reflection image hologram;
• ii) arranging the master hologram mask on the first face of a coupling element having a second face through which an exposure beam may pass for reconstructing the pattern recorded in the volume hologram;
• iii) providing an illumination system with an exposure beam for illuminating the master hologram mask through the second face of the coupling element and for reconstructing the pattern recorded in the volume hologram;
• iv) providing a recording plate comprising a layer of a surface-relief holographic recording material on a first surface of a second substrate;
• v) arranging the recording plate on the master hologram mask such that the recording layer is in proximity or contact with the volume hologram and such that light in an exposure beam from said illumination system that illuminates the volume hologram but is not diffracted by the volume hologram is transmitted into the recording layer;
• vi) inhibiting the recording by an exposure beam from said illumination system of the reflection image hologram in the recording layer;
• vii) illuminating the master hologram mask with an exposure beam from the illumination system and recording the transmission image hologram in the recording layer;
• viii) processing the recording plate to form a surface-relief structure in the recording layer.