Apparatus and method for forming a plasma
AssigneeEdwards Limited
InventorAndrew Seeley
Life of this patent
Estimating the term…
Abstract
Apparatus is described for treating an effluent gas stream from a semiconductor manufacturing process tool. The apparatus comprises a plasma torch for generating a glow discharge from an inert, ionisable gas. The gas stream is conveyed to the glow discharge to ignite a plasma. A source of electromagnetic radiation supplies electromagnetic radiation to the effluent gas stream to sustain the plasma. The apparatus is particularly suitable for treating perfluorinated and hydroflurocarbon compounds in the effluent gas stream.
Claims41
An apparatus for forming a sustained plasma to treat a gas comprising;
- means for generating an ionized fluid stream wherein the ionized fluid stream is generated from a fluid different than the gas to be treated;
- and
- a structure arranged to sustain the plasma.
Apparatus for treating an effluent gas stream from a semiconductor manufacturing process tool, the apparatus comprising means for generating an ionized fluid stream from a fluid different from the effluent gas stream, means for conveying the effluent gas stream to the ionized fluid stream to ignite a plasma, and means for applying electromagnetic radiation to the effluent gas stream to sustain the plasma.
A method of forming a plasma for treating a gas comprising
- generating an ionized fluid stream for igniting the plasma, wherein the ionized fluid stream is generated from a fluid different from the gas to be treated by the plasma;
- and
- supplying electromagnetic radiation to sustain the plasma.
A method of treating an effluent gas stream from a semiconductor manufacturing process tool, the method comprising the steps of generating an ionized fluid stream from a fluid different from the effluent gas stream, applying the ionized fluid stream to the effluent gas stream to ignite a plasma, and supplying electromagnetic radiation to the effluent gas stream to sustain the plasma.
An apparatus for treating a gas with a plasma formed from a glow discharge fluid comprising:
- a first chamber for receiving the gas;
- a supply of microwave radiation connected to the first chamber;
- a second chamber having an inlet for the glow discharge fluid, the second chamber in fluid communication with the first chamber;
- and
- a glow discharge electrode positioned in the second chamber.
Dependencies are inferred from the claim text.