Imprint lithography
AssigneeASML Netherlands B.V.
InventorsHelmar Santen, Aleksey Kolesnychenko
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Abstract
An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template and a substrate table, the template holder having a gas bearing configured to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on the substrate table.
Claims20
An imprint lithography apparatus comprising a template holder configured to hold an imprint template and a substrate table, the template holder having a gas bearing configured to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on the substrate table.
A method of imprint lithography comprising moving an imprint template using a gas bearing between an imprint position in which the imprint template applies a pattern to imprintable material on a substrate, and a disengaged position in which the imprint template does not apply a pattern to the imprintable material.
A template holder configured to hold an imprint lithography template, the template holder comprising a gas bearing arranged to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on a substrate table.
Dependencies are inferred from the claim text.