A process for preparing an organic thin film transistor comprising a substrate, an organic thin film, a gate electrode formed on one surface of the organic thin film via a gate insulating film, and source/drain electrodes formed in contact with one surface or the other surface of the organic thin film on both sides of the gate electrode, which comprises forming the organic thin film as a monomolecular film or an accumulated monomolecular film, using a silicon compound represented by the formula:
- R—SiX1X2X3 (I),
- wherein R is an organic residue in which a plurality of π-electron conjugated units having a terminus optionally substituted with a functional group are bound, and X1, X2 and X3 are, the same or different, a group which affords hydroxyl group by hydrolysis.