Method and apparatus for controlled manufacturing of nanometer-scale apertures

A method according to any one of the preceding claims, wherein the shape and the surface area of the initially provided at least one aperture are chosen such that, upon supply of said energy, under the influence of gravity and surface tension, the respective aperture gets and/or preserves a substantially circular surface and that, at the same time or subsequently, the diameter thereof reduces.

A method according to any one of the preceding claims, wherein the at least one aperture is provided in a SiO2 layer or the edges of the aperture are coated with a layer of SiO2, prior to supply of the energy for adjustment of the aperture.

A method according to any one of the preceding claims, wherein, for the supply of energy, use is made of an electron microscope.

A method according to any one of the preceding claims, wherein, for the control of the surface area size, at least the diameter or radius of the at least one aperture, use is made of an image recording device such as a CCD screen or a fluorescent screen and image analysis software.

A method according to any one of the preceding claims, wherein the at least one aperture is provided in a free-standing silicon membrane, preferably in a microchip, wherein micro manufacturing techniques are used for the formation of a membrane, in particular with a top single-crystal silicon layer, which membrane is provided with a SiO2 layer, preferably on two opposite surfaces, after which the at least one aperture is provided with standard technique, in particular etching technique such as e-beam lithography and reactive ion etching, wherein, thereupon, the edges of the at least one aperture are provided with a SiO2 layer, after which the said energy is supplied for adjustment of the dimension of the respective aperture.

A method according to any one of the preceding claims, wherein the at least one aperture initially has a surface area approximately corresponding to that of a circle with a diameter of less than approximately 100 nm, more in particular less than approximately 80 nm.

A method according to any one of the preceding claims, wherein the rate of adjustment of the at least one aperture is regulated by regulation of the amount of energy supplied per time unit.

Use of an electron microscope for controlledly adjusting the surface area of a nanometer-scale aperture in an object, in particular a membrane.

An assembly of a device for directedly emitting an electron beam, a device for observing an aperture in an object, at least changes in this aperture, and a regulating device for controlling the device for emitting the electron beam on the basis of signals coming from the device for observing the aperture, at least changes therein.