Back to results
US 2006/0231759 A1Published application
Uniform broad ion beam deposition
OwnerMervyn Davisinventor
Life of this patent
Estimating the term…
Abstract
Apparatus for the generation of a plurality of ion beams for use in vacuum sputtering methods is disclosed comprising: a discharge chamber, defined by a plasma confinement vessel, for generation of a plasma therein; and a plurality of facets located on the discharge chamber, each facet comprising acceleration and extraction means for extracting ions from the plasma in the discharge chamber in an ion beam.
Claims55
Apparatus for the generation of a plurality of ion beams, comprising:
- a discharge chamber, defined by a plasma confinement vessel, for generation of a plasma therein;
- and
- a plurality of facets located on the discharge chamber, each facet comprising a respective acceleration and extraction means for extracting ions from the plasma in the discharge chamber in an ion beam.
Dependencies are inferred from the claim text.