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US 2006/0231523 A1Published application
Method to planarize perpendicular write poles using a combination of CMP and reactive ion milling
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorsAmanda Baer, Hamid Balamane, Michael Feldbaum, Ming Jiang, Aron Pentek, Neil Robertson, Sue Zhang
Life of this patent
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Abstract
A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.
Claims27
A method of manufacturing a perpendicular write head comprising:
- forming a mill mask upon a laminate layer;
- depositing a first hark mask upon the mill mask;
- depositing a second hard mask upon the first hard mask;
- depositing a photoresist layer upon the second hard mask;
- removing the photoresist layer, the second and third hard masks;
- milling to form a beveled main pole;
- depositing field filler to encapsulate the milled main pole, mill mask and first hard mask;
- polishing the deposited alumina to a level above the mill mask;
- milling the polished alumina to expose a portion of the mill mask;
- and removing the first hard mask and the mill mask.
7 more elements
A perpendicular write head comprising:
- a beveled main pole having corners defining a track width having a planarized surface and encapsulated on either side thereof and below by a field filler alumina layer, the field filler layer having a polished surface and extending above the main pole on either side thereof as steps.
A disc drive comprising:
- a perpendicular write head having a beveled main pole having corners defining a track width and a planarized surface and encapsulated on either side thereof and below by a field filler layer, the field filler layer having a polished surface and extending above the main pole on either side thereof as steps
Dependencies are inferred from the claim text.