Load lock apparatus, processing system and substrate processing method
AssigneeTokyo Electron Limited
InventorKatsuhiko Iwabuchi
Life of this patent
Estimating the term…
Abstract
A load lock apparatus including a carry port provided on a side of a carry-in/out section for carrying a substrate in/out from/to the outside, and a carry port provided on a side of a processing section for processing the substrate, includes: a temperature controlling plate for controlling a temperature of the substrate, the temperature controlling plate configured including a plate body made of a porous material and a temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to the plate body. The temperature controlling gas passes through the plate body, blows out from a surface of the plate body, and is supplied to the substrate.
Claims22
A load lock apparatus including a carry port provided on a side of a carry-in/out section for carrying a substrate in/out from/to the outside, and a carry port provided on a side of a processing section for processing the substrate, said apparatus comprising:
- a temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus,
- said temperature controlling plate comprising a plate body made of a porous material and a temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to said plate body,
- wherein the temperature controlling gas passes through said plate body, blows out from a surface of said plate body, and is supplied to the substrate.
A load lock apparatus including a carry port provided on a side of a carry-in/out section for carrying a substrate in/out from/to the outside, and a carry port provided on a side of a processing section for processing the substrate, said apparatus comprising:
- a temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus,
- said temperature controlling plate comprising a plate body made of a porous material, a temperature controller provided in said plate body, and a gas supply path for supplying a gas to said plate body,
- wherein the gas is controlled in temperature when passing through said plate body temperature-controlled by said temperature controller, blows out from a surface of said plate body, and is supplied to the substrate.
A substrate processing system comprising a processing section for processing a substrate;
- a carry-in/out section for carrying the substrate in/out;
- and a load lock section provided between said processing section and said carry-in/out section,
- wherein said load lock section comprises a first load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate;
- and a second load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate,
- each of said first load lock apparatus and said second load lock apparatus comprising a temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus,
- each of said temperature controlling plates of said first load lock apparatus and said second load lock apparatus comprising a plate body made of a porous material and a temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to said plate body,
- wherein the temperature controlling gas passes through said plate body, blows out from a surface of said plate body, and is supplied to the substrate.
A substrate processing system comprising a processing section for processing a substrate;
- a carry-in/out section for carrying the substrate in/out;
- and a load lock section provided between said processing section and said carry-in/out section,
- wherein said load lock section comprises a first load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate;
- and a second load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate,
- each of said first load lock apparatus and said second load lock apparatus comprising a temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus,
- said temperature controlling plate of said first load lock apparatus comprising a plate body made of a porous material and a temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to said plate body,
- wherein the temperature controlling gas passes through said plate body, blows out from a surface of said plate body, and is supplied to the substrate,
- said temperature controlling plate of said second load lock apparatus comprising a plate body made of a porous material, a temperature controller provided in said plate body, and a gas supply path for supplying a gas to said plate body, wherein the gas is controlled in temperature when passing through said plate body temperature-controlled by said temperature controller, blows out from a surface of said plate body, and is supplied to the substrate.
A substrate processing system comprising a processing section for processing a substrate;
- a carry-in/out section for carrying the substrate in/out;
- and a load lock section provided between said processing section and said carry-in/out section,
- wherein said load lock section comprises a first load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate;
- and a second load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate,
- each of said first load lock apparatus and said second load lock apparatus comprising a temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus,
- each of said temperature controlling plates of said first load lock apparatus and said second load lock apparatus comprising a plate body made of a porous material, a temperature controller provided in said plate body, and a gas supply path for supplying a gas to said plate body, wherein the gas is controlled in temperature when passing through said plate body temperature-controlled by said temperature controller, blows out from a surface of said plate body, and is supplied to the substrate.
A method of carrying a substrate from a carry-in/out section into a processing section via a load lock section, and processing the substrate in the processing section, said method comprising the steps of:
- opening a carry port provided on the carry-in/out section side of the load lock section with a carry port provided on the processing section side of the load lock section kept closed, and carrying the substrate into the load lock section via the carry port provided on the carry-in/out section side;
- closing the carry port provided on the carry-in/out section side, bringing a temperature controlling plate including a plate body made of a porous material close to a front surface or a rear surface of the substrate, passing a temperature controlling gas controlled in temperature through the plate body, and supplying the gas from the plate body to the substrate to control a temperature of the substrate;
- and
- opening the carry port provided on the processing section side with the carry port provided on the carry-in/out section side kept closed, and carrying the substrate into the processing section via the carry port provided on the processing section side.
A method of carrying a substrate from a carry-in/out section into a processing section via a load lock section, and processing the substrate in the processing section, said method comprising the steps of:
- opening a carry port provided on the carry-in/out section side of the load lock section with a carry port provided on the processing section side of the load lock section kept closed, and carrying the substrate into the load lock section via the carry port provided on the carry-in/out section side;
- closing the carry port provided on the carry-in/out section side, bringing a temperature controlling plate including a plate body made of a porous material close to a front surface or a rear surface of the substrate, controlling a temperature of a temperature controller provided in the plate body, passing a gas through the plate body to control a temperature of the gas by the plate body temperature-controlled by the temperature controller, and supplying the gas controlled in temperature from the plate body to the substrate to control a temperature of the substrate;
- and
- opening the carry port provided on the processing section side with the carry port provided on the carry-in/out section side kept closed, and carrying the substrate into the processing section via the carry port provided on the processing section side.
Dependencies are inferred from the claim text.