Imprint lithography
AssigneesASML Netherlands B.V., Koninklijke Philips Electronics N.V.
InventorsPeter Bartus Meijer, Aleksey Kolesnychenko
Life of this patent
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Abstract
An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.
Claims37
An imprint template configured to imprint an imprintable medium by an imprint lithography process, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density.
An imprint template configured to imprint an imprintable medium, by an imprint lithography process, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have differences in pattern density which are minimized.
An imprint template configured to imprint an imprintable medium by an imprint lithography process, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have differences in pattern density which are maintained below a maximum.
An imprinting method, comprising:
- contacting an imprintable medium in a flowable state on a target portion of a surface of a substrate with a template, the template defining an imprint pattern having a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of the pattern, the pattern comprising adjacent regions, each of which will provide different functionality once imprinted onto the substrate, having substantially the same pattern density;
- subjecting the imprintable medium to conditions to change the imprintable medium into a substantially non-flowable state;
- and
- separating the template from the imprintable medium while in the substantially non-flowable state.
An imprinting method, comprising:
- contacting an imprintable medium in a flowable state on a target portion of a surface of a substrate with a template, the template defining an imprint pattern having a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of the pattern, the pattern comprising adjacent regions, each of which will provide different functionality once imprinted onto the substrate, having differences in pattern density which are minimized;
- subjecting the imprintable medium to conditions to change the imprintable medium into a substantially non-flowable state;
- and
- separating the template from the imprintable medium while in the substantially non-flowable state.
An imprinting method, comprising:
- contacting an imprintable medium in a flowable state on a target portion of a surface of a substrate with a template, the template defining an imprint pattern having a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of the pattern, the pattern comprising adjacent regions, each of which will provide different functionality once imprinted onto the substrate, having differences in pattern density which are maintained below a maximum;
- subjecting the imprintable medium to conditions to change the imprintable medium into a substantially non-flowable state;
- and
- separating the template from the imprintable medium while in the substantially non-flowable state.
Dependencies are inferred from the claim text.