System for controlling a plurality of lot processes, method for controlling a plurality of lot processes and method for manufacturing a semiconductor device
OwnerKazuo Sakiinventor
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Abstract
A system for controlling lot processes, which are executed in parallel, includes: first and second processing tools processing wafers classified into the lots; a transfer tool transferring the wafers from the first to second processing tools; a recipe storage unit storing recipe data including first and second process periods; a determination module determining first abd second starting times so as to minimize a waiting interval between the first and second process periods, based on the recipe data; and a control module controlling the first and second processing tools by starting operations at the first and second starting times, respectively.
Claims20
A system for controlling a plurality of lot processes, which are executed in parallel, the system comprising:
- first and second processing tools configured to process a plurality of wafers classified into the plurality of lots;
- a transfer tool configured to transfer the wafers from the first to second processing tools;
- a recipe storage unit configured to store recipe data including a first process period by the first processing tool and a second process period by the second processing tool;
- a determination module configured to determine a first starting time of the first process period and a second starting time of the second process period so as to minimize a waiting interval between completion of the first process period and start of the second process period, based on the recipe data;
- and
- a control module configured to control the first and second processing tools by starting operations at the first and second starting times so as to execute the lot processes by the first and second processing tools, respectively.
A method for controlling a plurality of lot processes, which are executed in parallel, the method comprising:
- determining first and second starting times for first and second processes processing a plurality of wafer s classified into the plurality of lots continuously without exposing the wafers to an atmosphere, so as to minimize a waiting interval between completion of the first process and start of the second process, based on a first process period of the first process and a second process period of the second process defined by recipe data;
- and
- starting processing of the first and second processes at the first and second starting times, respectively.
A method for manufacturing a semiconductor device comprising:
- determining a first starting time for starting nitridation of an oxide film on a wafer and a second starting time for starting annealing of the nitridated oxide film respectively, so as to minimize a waiting interval between completion of the nitridation and starting of the annealing, based on a first process period of the nitridation and a second process period of the annealing, as defined by a recipe;
- fabricating the oxide film on the wafer;
- starting nitridation of the oxide film at the first starting time;
- and
- starting annealing of the nitridated oxide film at the second starting time, without exposing the wafer to an atmosphere.
Dependencies are inferred from the claim text.