Method for manufacturing optical semiconductor element, and optical semiconductor element

A method for manufacturing an optical semiconductor element, comprising:

• a first process of forming, above a substrate, a first semiconductor layer composed of a first conductivity type, a second semiconductor layer that functions as an active layer, a third semiconductor layer composed of a second conductivity type and a fourth semiconductor layer;
• a second process of forming at least a part of a functional section by patterning at least a part of the fourth semiconductor layer;
• a third process of forming the functional section and a light emitting element section by patterning at least the third semiconductor layer;
• a fourth process of forming first and second electrodes for driving the light emitting element section;
• and
• a fifth process of forming a third electrode that connects the light emitting element section with the functional section,
• wherein dry etching is conducted and thereafter wet etching is conducted in the second process to thereby form at least a part of the functional section.