Mask, Method for Producing Mask, and Method for Producing Wired Board
AssigneeBrother Kogyo Kabushiki Kaisha
InventorMasanori Tsuruko
Life of this patent
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Abstract
A mask, through which a plurality of slender through-holes are formed, has a reinforcing section which is formed to span the through-holes, wherein recesses are provided at portions of the reinforcing section to cover the through-holes. Accordingly, a metal, which is subjected to the sputtering, easily makes the detour around the reinforcing section. Therefore, a metal film is easily formed even on portions shadowed by the reinforcing section. It is possible to accurately form a fine wiring pattern.
Claims20
A mask comprising a flat plate-shaped mask body which is formed with a plurality of through-holes, and a reinforcing section which is arranged on one surface of the mask body so as to straddle over the through-holes and which reinforces the mask body, wherein:
- a length between a surface of the mask body on a side opposite to the one surface of the mask body and a surface of the reinforcing section facing the through-holes is longer than a thickness of the mask body.
A method for producing a mask including a flat plate-shaped mask body which is formed with a plurality of through-holes, and a reinforcing section which is arranged so as to straddle over the through-holes and which reinforces the mask body, the method comprising:
- a step of providing a flat plate-shaped mask base material;
- a first guide pattern-forming step of forming, on one surface of the mask base material, a first guide pattern for forming the through-holes;
- a first etching step of performing etching, in accordance with the first guide pattern, for a portion of the one surface of the mask base material on which the first guide pattern has been formed, such that no penetration is caused through the mask base material;
- a second guide pattern-forming step of forming, on the other surface of the mask base material, a second guide pattern for forming the reinforcing section;
- and
- a second etching step of performing etching, for the other surface of the mask base material except for an area in which the reinforcing section is to be formed, in accordance with the second guide pattern on the other surface, such that penetration is caused through the portion of the one surface having been subjected to the etching in the first etching step.
Dependencies are inferred from the claim text.