Glow discharge-generated chemical vapor deposition
OwnerAaron Gabelnick, Christina Lambertinventors
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Abstract
A process for creating plasma polymerized deposition on a substrate using a glow discharge is described. The glow discharge is created between an electrode and a counterelectrode. A mixture of a balance gas and a tetraalkylorthosilicate is flowed through the glow discharge onto a substrate to deposit a coating onto the substrate as an optically clear coating or to create surface modification. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clear powder-free or virtually powder free coating.
Claims11
A process for depositing a film coating on the exposed surface of a substrate, characterized by the steps of:
- (a) creating a glow discharge in a region between an electrode and a counterelectrode;
- and (b) flowing a mixture comprising a balance gas, a tetraalkylorthosilicate and, optionally, a carrier gas for the tetraalkylorthosilicate through the glow discharge and onto or in the vicinity of at least one surface of said substrate at a flow velocity of from about 0.05 m/s to about 5 m/s, the concentration of the tetraalkylorthosilicate in the mixture being in the range of from more than 2000 ppm to about 10000 ppm to form a film coating on the substrate.
Dependencies are inferred from the claim text.