Apparatus, method and system for fabricating a patterned media imprint master
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorsThomas Albrecht, Henry Yang
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Abstract
An apparatus, system, and method are disclosed for fabricating a patterned media imprint master. A substrate and a deposition mask may be fixably attached by an intervening spacing element, such that the substrate and deposition mask act as a unified element during a deposition process. A deposition mask may include a plurality of apertures generated by a conventional lithographic process. Material may be deposited onto the substrate through the deposition mask from more than one deposition source oriented at a unique deposition angle. A resulting substrate deposition pattern thus exhibits a density greater than a deposition mask aperture density while avoiding deposition pattern distortion.
Claims20
An apparatus for fabricating patterned media, the apparatus comprising:
- a substantially planar substrate;
- a deposition mask coupled to the substrate, the deposition mask having a plurality of apertures adapted to direct a material onto the substrate;
- and
- at least one deposition source adapted to deposit the material through the plurality of apertures at various deposition angles to produce substantially concentric recording regions having a density greater than the plurality of apertures.
A method for fabricating patterned media, comprising:
- providing a substantially planar substrate;
- providing a deposition mask having a plurality of apertures adapted to direct a deposition material onto the substrate;
- fixably coupling the substrate to the deposition mask;
- directionally depositing the deposition material through the plurality of apertures at various deposition angles to form on the substrate substantially concentric recording regions having a density greater than the plurality of apertures;
- and
- detaching the substrate from the deposition mask.
A system for fabricating patterned media, comprising:
- a deposition assembly comprising a substantially planar substrate coupled to a deposition mask, the deposition mask having a plurality of apertures adapted to direct a deposition material onto the substrate;
- at least one deposition source adapted to deposit the deposition material through the plurality of apertures at various deposition angles to produce substantially concentric recording regions having a density greater than the plurality of apertures;
- a rotational element coupled to the deposition assembly to rotate the substrate and the deposition mask during deposition;
- and
- a shield proximate the deposition mask to constrain a variance in the various deposition angles as the deposition material is deposited.
Dependencies are inferred from the claim text.