Objectives as a microlithography projection objective with at least one liquid lens
AssigneeCarl Zeiss SMT GmbH
InventorsDavid Shafer, Susanne Beder, Karl-Heinz Schuster
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AssigneeCarl Zeiss SMT GmbH
InventorsDavid Shafer, Susanne Beder, Karl-Heinz Schuster
Estimating the term…
The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
A microlithography projection objective having a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, with a refractive index nL, and at least one liquid lens made from a transparent liquid, with a refractive index nF,
Dependencies are inferred from the claim text.