Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsVadim Banine, Johannes Moors, Leonid Shmaenok, Nikolay Salashchenko
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Abstract
A multi-layered spectral purity filters improveS the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam and also collect debris emitted from a radiation source.
Claims25
A lithographic spectral purity filter comprising a multi-layered structure of alternating layers, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting or absorbing undesired radiation, the spectral purity filter also being configured to collect debris emitted from a radiation source.
A lithographic apparatus, comprising:
- an illumination system configured to condition a radiation beam;
- a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
- and
- a spectral purity filter comprising a multi-layered structure of alternating layers and configured to enhance the spectral purity of the radiation beam by reflecting or absorbing undesired radiation, the spectral purity filter also being configured to collect debris emitted from a radiation source.
A lithographic apparatus comprising a spectral purity filter including a multi-layered structure of alternating layers, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting or absorbing undesired radiation, the spectral purity filter also being configured to collect debris emitted from a radiation source.
A device manufacturing method, comprising:
- providing a beam of radiation;
- patterning the beam of radiation;
- projecting a patterned beam of radiation onto a target portion of the substrate;
- and
- enhancing the spectral purity of the beam or radiation by reflecting or absorbing undesired radiation using a spectral purity filter comprising a multi-layered structure of alternating layers.
Dependencies are inferred from the claim text.