Method for compensating errors in interferometric surface metrology
AssigneeZygo Corporation
InventorLeslie Deck
Life of this patent
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Abstract
An method for determining a surface profile of an object is described. The method typically includes providing a surface profile (e.g., a height profile) of a test object measured by an interferometric profiler. Information related to field- and object orientation-dependent systematic errors of the interferometric profiler is provided. The surface profile is corrected based on the field- and orientation-dependent errors. Also described is a method for determining the field- and orientation dependent errors of a profiler.
Claims26
A method comprising:
- providing a surface profile of a test object measured by an interferometric profiler;
- providing field- and orientation-dependent information about systematic errors in the interferometric profiler;
- and
- using the field- and orientation-dependent information to improve an accuracy of the surface profile of the test object.
An article comprising a computer readable medium containing a program that causes a processor to improve an accuracy of a surface profile of a test object measured by an interferometric profiler using field- and orientation-dependent information about systematic errors in the interferometric profiler.
An apparatus comprising:
- an interferometric profiler configured to measure a surface profile of a test object;
- and
- an electronic processor configured to improve an accuracy of the measured surface profile by using field- and orientation-dependent information about systematic errors in the interferometric profiler.
A method, comprising:
- measuring a surface profile of an object using an optical profiler for each of N different orientations of the object;
- and
- determining a field- and orientation-dependence of systematic errors of the profiler based on the N surface profiles.
A method, comprising:
- providing a surface profile of a test object measured by an interferometric profiler;
- and
- modifying values of the surface profile based on calibration data indicative of a field- and orientation dependence of the interferometric profiler.
Dependencies are inferred from the claim text.