Method for comparing semiconductor characteristic curves

An analysis method for semiconductor-device measurement results, the analysis method comprising:

• a storing step of storing semiconductor-device measurement results and a graph display program;
• a displaying step of displaying the measurement results in graphs in individual windows;
• an inputting step of selecting some of the windows;
• and
• a computing step of superimposing and displaying the graphs in the windows, by using the graph display program, so that only a display area of the graph in one of the windows selected in the inputting step, the one window being located at the topmost layer displayed in the displaying step, is made transparent, an area other than the display area of the graph is made opaque, at least a display area of the graph located in the window displayed at the bottommost layer is made opaque, and at least a display area of the graph in the window located at a layer between the topmost layer and the bottommost layer is made transparent.

A computer program for achieving an analysis method for semiconductor-device measurement results, comprising steps of:

• a storing step of storing semiconductor-device measurement results and a graph display program;
• a displaying step of displaying the measurement results in graphs in individual windows;
• an inputting step of selecting some of the windows;
• and a computing step of superimposing and displaying the graphs in the windows, by using the graph display program, so that only a display area of the graph in one of the windows selected in the inputting step, the one window being located at the topmost layer displayed in the displaying step, is made transparent, an area other than the display area of the graph is made opaque, at least a display area of the graph located in the window displayed at the bottommost layer is made opaque, and at least a display area of the graph in the window located at a layer between the topmost layer and the bottommost layer is made transparent, the program causing a processor to execute:
• a command for performing processing so that only a display area of the graph in the window displayed at the topmost layer in the displaying step is made transparent and an area other than the display area is made opaque;
• a command for performing processing so that at least a display area of the graph in the window displayed at the bottommost layer in the displaying step is made opaque;
• a command for performing processing so that at least a display area of the graph in the window located at a layer displayed between the topmost layer and the bottommost layer in the displaying step is made transparent;
• and
• a command for displaying, in the displaying step, the graphs in the windows and superimposing the graphs so that axes of the graphs are aligned with one another.