Group III-nitride layers with patterned surfaces
AssigneeAlcatel-Lucent USA Inc.
InventorsAref Chowdhury, Hock Ng, Richart Slusher
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Abstract
A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.
Claims13
1-20. (canceled)
A method, comprising:
- providing a substrate with a planar surface;
- forming a crystalline layer of a group III-nitride over the surface of the substrate;
- and
- subjecting the layer to an aqueous solution of base to etch the layer such that a plurality of pyramids are formed on a first lateral region of the layer and are not formed on a second lateral region of the layer.
An apparatus, comprising:
- a layer of group III-nitride having a top surface, the top surface having a plurality of pyramidal structures of the group III-nitride;
- and
- an electrode located on the layer between portions of the layer having the pyramidal structures.
Dependencies are inferred from the claim text.