Semiconductor device
AssigneeSanyo Electric Co., Ltd.
InventorsShuichi Kikuchi, Shigeaki Okawa, Kiyofumi Nakaya, Toshiyuki Takahashi
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AssigneeSanyo Electric Co., Ltd.
InventorsShuichi Kikuchi, Shigeaki Okawa, Kiyofumi Nakaya, Toshiyuki Takahashi
Estimating the term…
In a conventional semiconductor device, there has been a problem that, in a region where a wiring layer to which a high electric potential is applied traverses a top surface of an isolation region, the withstand voltage is deteriorated. In a semiconductor device of the present invention, an epitaxial layer is deposited on a substrate, and an LDMOSFET is formed in one region divided by an isolation region. In a region where a wiring layer connected to a drain electrode traverses a top surface of the isolation region, a conductive plate having a ground electric potential and another conductive plate in a floating state are formed under the wiring layer. With this structure, electric field is reduced in the vicinity of the isolation region under the wiring layer, whereby a withstand voltage of the LDMOSFET is increased.
A semiconductor device comprising:
A semiconductor device comprising:
A semiconductor device comprising:
Dependencies are inferred from the claim text.