Contamination barrier and lithographic apparatus comprising same
AssigneeASML Netherlands B.V.
InventorArnoud Wassink
Life of this patent
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Abstract
A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented relative to a central rotation axis of the contamination barrier. The blades comprise a metal compound having crystals oriented generally radially relative to the central rotation axis.
Claims21
A rotatable contamination barrier for use in an EUV system, the barrier comprising a plurality of closely packed blades configured to trap contaminant material coming from an EUV radiation source, the blades radially oriented relative to a central rotation axis of the contamination barrier, wherein the blades comprise a metal compound having a uniform crystal orientation oriented generally radially relative to the central rotation axis.
A method of providing a rotatable contamination barrier, the method comprising:
- axially compressing a rod of metal compound material having orientable crystals by forging so that the rod starts to expand in an expansion zone and the crystals radially align in the expansion zone;
- and
- cutting a blade structure in the expansion zone around a central zone, so as to provide the contamination barrier.
A method of providing a rotatable contamination barrier, the method comprising:
- providing a folded blade shape from a rolled sheet of metal compound material having a uniform crystal orientation oriented along a rolling direction, the fold oriented transverse to the rolling direction;
- engaging the folds by mounting elements to hold the folds parallel to a central rotation axis of the contamination barrier;
- and
- orienting the blades radially relative to the rotation axis, so as to provide the contamination barrier.
A lithographic apparatus, comprising:
- a rotatable contamination barrier comprising a plurality of closely packed blades configured to trap contaminant material coming from a radiation source, the blades radially oriented relative to a central rotation axis of the contamination barrier, wherein the blades comprise a metal compound material having a uniform crystal orientation oriented generally radially relative to the central rotation axis;
- an illumination system configured to condition a beam of radiation;
- a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- and
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate.
Dependencies are inferred from the claim text.