Multichannel ion gun
AssigneeAxcelis Technologies, Inc.
InventorVictor Benveniste
Life of this patent
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Abstract
The present invention discloses systems and methods for generating low energy, high current ion beams by scaling beamline dimensions and employing multiple beamlines. An array of beamlets is generated by an ion source. The beamlets then pass through a mass analysis module that permits selected ions to pass while blocking other ions and/or particles. The selected ions can then be accelerated to a desired energy level. Subsequently, the beamlets are diverged in horizontal and vertical directions to form a single low energy, high current ion beam.
Claims26
A multi-channel ion implantation system comprising:
- a beam source that generates a beamlet array;
- and
- a beamline assembly that comprises:
- a mass analyzer module that operates on the beamlet array to remove ions having a non-selected mass energy product;
- and
- a beam formation component that combines the beamlet array into a single ion beam.
A multi-channel ion implantation system comprising:
- a beam source and triode extraction assembly that generate a beamlet array;
- and
- a beamline assembly comprising an array of channels through which the beamlet array passes, the beamline assembly comprising:
- a first array of magnets comprised of pairs of permanent magnets defining a first magnetic field between the pairs of magnets;
- first beamguide spacers positioned in between columns of the first array of magnets, wherein the first beamguide spacers comprise channels through which the beamlet array passes;
- a first slit positioned downstream of the first array of magnets and having a first resolution that permits passage of ions having a selected mass energy product and substantially blocks other ions having a non-selected mass energy product;
- horizontal partition plates positioned downstream of the first array of magnets and positioned between rows of magnets of the first array of magnets;
- a second array of magnets positioned downstream of the vertical deflection plates and comprised of pairs of permanent magnets defining a second magnetic field between the pairs of magnets;
- second beamguide spacers positioned in between columns of the second array of magnets, wherein the second beamguide spacers comprise channels through which the beamlet array passes;
- a second slit positioned downstream of the second array of magnets having a second resolution that permits passage of ions having the selected mass energy product and substantially blocks other ions having a non-selected mass energy product;
- vertical deflection plates positioned downstream of the second slit and in between rows of the beamlet array that cause the beamlets within the array to diverge in a vertical direction;
- and
- a drift region positioned downstream of the vertical deflection plates that cause the beamlets within the array to diverge in a horizontal direction and form into a single ion beam.
A method for generating a low energy, high current ion beam comprising:
- generating an array of beamlets;
- performing a mass analysis on the array of beamlets that causes ions having a selected mass energy product to deflect at a first angle;
- blocking other ions having a non-selected mass energy product;
- and
- diverging the array of beamlets in a horizontal direction and a vertical direction to form the low energy, high current ion beam.
Dependencies are inferred from the claim text.