Detecting apparatus and device manufacturing method
AssigneesEbara Corporation, Kabushiki Kaisha Toshiba
InventorsMasahiro Hatakeyama, Takeshi Murakami, Tohru Satake, Nobuharu Noji, Ichirota Nagahama, Yuichiro Yamazaki
Life of this patent
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Abstract
A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
Claims10
A detecting apparatus for detecting a defect on a surface of a sample, comprising:
- a radiation source for emitting an UV-ray or a Laser beam toward the sample held in a vacuum environment;
- an electron gun for emitting an irradiation beam toward the sample so that secondary electrons are emanated from the sample;
- an EB-CCD sensor for detecting the secondary electrons emanated from the sample, the EB-CCD sensor permitting the secondary electrons to enter the sensor surface directly to form a two dimensional image, said EB-CCD sensor being disposed in the vacuum environment;
- an electron-optical system for guiding the secondary electrons to the EB-CCD sensor;
- and
- a stage for mounting and moving the sample;
- wherein a processing device processes the image to detect a defect on the surface of the sample, and the processing device is disposed outside of the vacuum environment.
A detecting apparatus for detecting a defect on a surface of a sample, comprising:
- a radiation source for emitting an UV-ray or a Laser beam toward the sample held in a vacuum environment;
- an electron gun for emitting an irradiation beam toward the sample so that reflected electrons are emanated from the sample;
- an EB-CCD sensor for detecting the reflected electrons emanated from the sample, the EB-CCD sensor permitting the reflected electrons to enter the sensor surface directly to form a two dimensional image, said EB-CCD sensor being disposed in the vacuum environment;
- an electron-optical system for guiding the reflected electrons to the EB-CCD sensor;
- and
- a stage for mounting and moving the sample;
- wherein a processing device processes the image to detect a defect on the surface of the sample, and the processing device is disposed outside of the vacuum environment.
A detecting apparatus for detecting a defect on a surface of a sample, comprising:
- an electron gun for emitting an irradiation beam toward the sample held in a vacuum environment so that secondary electrons are emanated from the sample;
- an EB-CCD sensor for detecting the secondary electrons emanated from the sample, the EB-CCD sensor permitting the secondary electrons to enter the sensor surface directly to form a two dimensional image, said EB-CCD sensor being disposed in the vacuum environment;
- an electron-optical system for guiding the reflected electrons to the EB-CCD sensor;
- a stage for mounting and moving the sample;
- a flange for separating the vacuum environment and the atmosphere, said flange including a feed through which has conductive pins connected directly to a camera in the atmosphere;
- a sensor package for integrating the EB-CCD sensor and signal transmission pins;
- and
- a connecting socket for connecting the conductive pins of the feed through and the signal transmission pins, said connecting socket including an elastic member.
Dependencies are inferred from the claim text.