Centralized control architecture for a plasma arc system
AssigneeHypertherm, Inc.
InventorsTate Picard, Roger Young, Gregory Wilson, Ronald Huppe
Life of this patent
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Abstract
Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.
Claims11
1-47. (canceled)
A method for supplying gas to a plasma arc torch, comprising:
- providing a plurality of gases to a plasma arc torch;
- producing a gas mixture comprising the plurality of gases;
- adjusting a flow of at least one of the plurality of gases with at least a first flow control valve based on a measured pressure of the gas mixture;
- and
- adjusting the at least first flow control valve to produce the gas mixture.
A system for supplying gas to a plasma arc torch, comprising:
- a first flow control valve to control a flow of one of a plurality of gases provided to a plasma arc torch;
- and
- a first pressure transducer to measure a pressure of a mixture of the plurality of gases,
- wherein the first flow control valve adjusts the flow of the one of the plurality of gases based on the measured pressure of the gas mixture.
Dependencies are inferred from the claim text.