Substrate processing apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorTomomi Iwata
Life of this patent
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AssigneeDainippon Screen Mfg. Co., Ltd.
InventorTomomi Iwata
Estimating the term…
A dry-air supplying duct and a dry-air exhaust duct are opposite each other across a processing tank. Inside the dry-air supplying duct, a plurality of ventilation guides are provided that extend horizontally by a predetermined length from an end of the dry-air supplying duct, and a plurality of ventilation paths are formed by the plurality of ventilation guides. To an end of the dry-air supplying duct, a partition plate is attached such that it blocks a part of the plurality of ventilation paths. Also inside the dry-air supplying duct, a partition plate is attached such that it blocks a part of the plurality of ventilation paths. These partition plates are disposed in upper part of the dry-air supplying duct. As a result, an opening for injection of dry air is formed in a lower part of the dry-air supplying duct.
A substrate processing apparatus for performing a predetermined process on a substrate, comprising:
A substrate processing apparatus for performing a predetermined process on a substrate, comprising:
A substrate processing apparatus for performing a predetermined process on a substrate, comprising:
Dependencies are inferred from the claim text.