Substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsYoshiaki Sasaki, Yusuke Muraki, Eiichi Nishimura, Yuko Ono
Life of this patent
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Abstract
In a substrate processing apparatus comprising a processing unit where a specific type of processing is executed on a wafer and a transfer chamber through which a wafer is carried into/out of the processing unit, the transfer chamber includes an air intake unit through which external air is drawn into the transfer chamber, a discharge unit disposed so as to face opposite the air intake unit, through which the discharge gas in the transfer chamber is discharged and a discharge gas filtering means disposed at the discharge unit and constituted with a harmful constituent eliminating filter through which a harmful constituent contained in the discharge gas, at least, is eliminated.
Claims15
A substrate processing apparatus comprising:
- a processing unit in which a specific type of processing is executed on a substrate;
- and
- a transfer chamber through which the substrate is carried into/out of said processing unit, wherein:
- said transfer chamber includes:
- an air intake unit through which external air is drawn into said transfer chamber;
- a discharge unit disposed so as to face opposite said air intake unit, through which discharge gas inside said transfer chamber is released;
- and
- a discharge gas filtering means disposed at said discharge unit for filtering the discharge gas.
A substrate processing apparatus, comprising:
- a processing unit in which a specific type of processing is executed on a substrate;
- and
- a transfer chamber through which the substrate is carried into/out of said processing unit via a loadlock chamber, wherein:
- said loadlock chamber includes:
- an air intake unit through which external air is drawn into said loadlock chamber;
- an acid discharge unit that executes acid discharge in said loadlock chamber;
- and
- a discharge gas filtering means disposed at said acid discharge unit for filtering an acid discharge gas.
A substrate processing apparatus, comprising:
- a processing unit in which a specific type of processing is executed on a substrate;
- and
- a transfer chamber through which the substrate is carried into/out of said processing unit, which further includes:
- a standby unit connected to said transfer chamber and constituted with a substrate standby chamber where a substrate having undergone processing in said processing unit is temporarily held in standby and an acid discharge unit that executes an acid discharge in said substrate standby chamber;
- and
- a discharge gas filtering means disposed at said acid discharge unit of said standby unit for filtering acid discharge gas.
Dependencies are inferred from the claim text.