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US 2006/0217278 A1Published application
Composition and method for removing copper-compatible resist
AssigneeLG Display Co., Ltd.
InventorsGyoo-Chul Jo, Gee-Sung Chae, Oh-Nam Kwon, Kyoung-Mook Lee, Yong-Sup Hwang, Seong-Bae Kim, Suk-Chang Jang
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Abstract
A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
Claims9
A composition for removing a copper-compatible resist, comprising:
- about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound;
- about 10% to about 99% by weight of a glycolether compound;
- and
- about 0.5% to about 5% by weight of a corrosion inhibitor.
1 more element
9-25. (canceled)
Dependencies are inferred from the claim text.