Film-forming apparatus and film-forming method
AssigneeTokyo Electron Limited
InventorHiroyuki Matsuura
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AssigneeTokyo Electron Limited
InventorHiroyuki Matsuura
Estimating the term…
The present invention is a film-forming apparatus including: a longitudinal tubular processing container in which a vacuum can be created; an object-to-be-processed holding unit that holds a plurality of objects to be processed in a tier-like manner and that can be inserted into and taken out from the processing container; a heating unit provided around the processing container; a silane-based-gas supplying unit that supplies a silane-based gas into the processing container, the silane-based gas including no halogen element; a nitriding-gas supplying unit that supplies a nitriding gas into the processing container; an activating unit that activates the nitriding gas by means of plasma; and a controlling unit that controls the silane-based-gas supplying unit, the nitriding-gas supplying unit and the activating unit, in such a manner that the silane-based gas and the nitriding gas are supplied into the processing container at the same time while the nitriding gas is activated, in order to form a predetermined thin film on each of the plurality of objects to be processed.
A film-forming apparatus comprising:
A film-forming method comprising the steps of:
A storage unit capable of being read by a computer, storing a program to be executed by a computer in order to control a film-forming method, the film-forming method comprising a step of forming a predetermined thin film on each of a plurality of objects to be processed loaded into a longitudinal tubular processing container in which a vacuum can be created, by supplying a silane-based gas including no halogen element and a nitriding gas that has been activated by means of plasma at the same time into the processing container while heating the plurality of objects to be processed.
Dependencies are inferred from the claim text.