Lithographic apparatus, device manufacturing method, code reading device and substrate
AssigneeASML Netherlands B.V.
InventorsCornelis Huizer, Paulus Leonardus Van Dijk
Life of this patent
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Abstract
A two-dimensional mark has an array of pixels, and one or more reference marks. The array of pixels is used to encode an identifier for the substrate and/or any other desired information. In an embodiment, the array is 8 by 8 pixels providing 264 unique symbols, assuming a binary system wherein each pixel may be in one of two states.
Claims24
A lithographic apparatus arranged to transfer a substrate pattern from a patterning device onto a substrate, comprising a programmable patterning device arranged to transfer a pattern representing a code mark to the substrate.
A device manufacturing method, comprising:
- transferring a pattern representing a code mark to a substrate using a programmable patterning device;
- and
- transferring a substrate pattern from a patterning device onto the substrate.
A code reading device arranged to read a code mark on a substrate, the code mark comprising a pixel array and one or more reference markers.
A substrate having printed thereon a code mark comprising a pixel array and one or more reference markers.
Dependencies are inferred from the claim text.