Image forming method using photothermographic material

A method of forming an image using a photothermographic material containing a support having:

• an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent on one side of the support;
• and
• a backing layer on the other side of the support opposite the image forming layer,
• the method comprising the steps of:
• imagewise exposing the photothermographic material to light to form a latent image;
• and
• simultaneously or sequentially heating the exposed photothermographic material to develop the latent image,
• wherein a center-line mean roughness Ra(E) of an outermost surface of a side having the image forming layer is from 125 to 200 nm;
• or a center-line mean roughness Ra(B) of an outermost surface of a side having the backing layer is from 105 to 200 nm, and
• wherein a ratio of a ten-point mean roughness Rz(E) of the outermost surface of the side having the image forming layer to a center-line mean roughness Ra(E) of the outermost surface of the side having the image forming layer, Rz(E)/Ra(E), is from 10 to 70.

A method of forming an image using a photothermographic material containing a support having:

• an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent on one side of the support;
• and
• a backing layer on the other side of the support opposite the image forming layer,
• the method comprising the steps of:
• imagewise exposing the photothermographic material to light to form a latent image;
• and
• simultaneously or sequentially heating the exposed photothermographic material to develop the latent image,
• wherein a center-line mean roughness Ra(E) of an outermost surface of a side having the image forming layer is from 125 to 200 nm;
• or a center-line mean roughness Ra(B) of an outermost surface of a side having the backing layer is from 105 to 200 nm, and
• wherein a ratio of a ten-point mean roughness Rz(B) of the outermost surface of the side having the backing layer to a center-line mean roughness Ra(B) of the outermost surface of the side having the backing layer, Rz(B)/Ra(B), is from 20 to 70.