Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
AssigneeInternational Business Machines Corporation
InventorsWenjie Li, Pushkara Varanasi
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Abstract
A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition may be used to form patterned features on a substrate, such as those used in the manufacture of a semiconductor device.
Claims24
A positive photoresist composition comprising:
- a radiation sensitive acid generator;
- and
- a polymer, the polymer comprising:
- (i) a first repeating unit derived from a fluorosulfonamide monomer including one of the following two structures,
- in which M comprises a polymerizable backbone moiety, Z comprises a linking moiety comprising one of —C(O)O—, —C(O)—, —OC(O)—, —O—C(O)—C(O)—O—, R1 represents one of an alkylene, a cycloalkylene, an arylene, a semi- or perfluorinated alkylene, a semi- or perfluorinated cycloalkylene, and a semi- or perfluorinated arylene, p and q is 0 or 1, R2 represents one of hydrogen, fluorine, an alkyl group of 1 to 6 carbons, and a semi- or perfluorinated alkyl group of 1 to 6 carbons, n is an integer from 1 to 6, and R3 represents one of hydrogen, an alkyl, an aryl, a semi- or perfluorinated alkyl, and a semi- or perfluorinated aryl,
- and
- ii) a second repeating unit including a pendant acid-labile moiety, and
- iii) a repeating unit including a lactone moiety;
- and said polymer contains about 5-40 mole % of said repeating unit i).
A method of making a patterned structure on a substrate, the method comprising:
- depositing a positive photoresist composition on the substrate to form a positive photoresist layer, the positive photoresist composition comprising a radiation-sensitive acid generator and a polymer, the polymer comprising:
- i) a first repeating unit derived from a fluorosulfonamide monomer including one of the following structures,
- in which M comprises a polymerizable backbone moiety, Z comprises a linking moiety comprising one of —C(O)O—, —C(O)—, —OC(O)—, —O—C(O)—C(O)—O—, R1 represents one of an alkylene, cycloalkylene, an arylene, a semi- or perfluorinated alkylene, a semi- or perfluorinated cycloalkylene, and a semi- or perfluorinated arylene, p and q is 0 or 1, R2 represents one of hydrogen, fluorine, an alkyl group of 1 to 6 carbons, and a semi- or perfluorinated alkyl group of 1 to 6 carbons, n is an integer from 1 to 6, and R3 represents one of hydrogen, an alkyl, an aryl, a semi- or perfluorinated alkyl, and a semi- or perfluorinated aryl;
- and
- ii) a second repeating unit including a pendant acid-labile moiety, and
- iii) a repeating unit including a lactone moiety;
- and said polymer contains about 5-40 mole % of said repeating unit i);
- exposing the positive photoresist layer to a pattern of imaging irradiation;
- removing a portion of the positive photoresist layer that is exposed to the pattern of imaging radiation to reveal a pattern of spaces over the substrate, which pattern corresponds to the pattern of imaging irradiation;
- and
- subsequently transferring the pattern to the substrate.
Dependencies are inferred from the claim text.