Film forming method and producing method for electron source substrate
AssigneeCanon Kabushiki Kaisha
InventorSeiji Mishima
Life of this patent
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Abstract
In case of forming films in plural positions with an ink jet head having plural nozzles, to provide a method of efficiently correcting an aberration in the liquid droplet applying position resulting for example from a distortion of a substrate, thereby producing an electron source with a high production yield. Positions of device electrodes 2, 3 on the electron source substrate 1 are detected by fetching in advance a surface image of the substrate 1, then a position of an electroconductive film 4 is calculated as a liquid droplet applying position, and an inclination angle θ of the ink jet head 11 is so regulated that a pitch of the nozzles 12 matches a pitch d of the obtained liquid droplet applying positions.
Claims6
A film forming method for forming films in plural positions on a substrate by applying liquid droplets to the plural positions on the substrate from an ink jet head having plural nozzles arranged linearly, the method comprising:
- a step of detecting positional information of plural positions on the substrate;
- a step of calculating information of plural liquid droplet applying positions where the liquid droplets are to be applied, based on the positional information detected in the detecting step;
- and
- a step of rotating the ink jet head about a normal line normal to the substrate according to the information of plural liquid droplet applying positions and applying liquid droplets onto the substrate.
A method for producing an electron source substrate, comprising:
- a step of preparing a substrate provided with plural device electrodes arranged in a matrix pattern, and plural linear wirings connecting a part of the plural device electrodes, and detecting positional information of at least a part of the device electrodes among the plural device electrodes on the substrate;
- and
- a step of positioning an ink jet head, having plural nozzles arranged linearly, in opposition to the substrate and applying liquid droplets from the plural nozzles so as to be in contact with the device electrodes;
- wherein the liquid droplet applying step includes a first liquid droplet applying step of applying the liquid droplets in a state where a longitudinal direction of the wiring and a direction of the linear arrangement of the nozzles define a first angle based on the detected positional information, and a second liquid droplet applying step of applying the liquid droplets in a state where the longitudinal direction of the wiring and the direction of the linear arrangement of the nozzles define a second angle different from the first angle.
Dependencies are inferred from the claim text.