Method and apparatus for reviewing defects
AssigneeHitachi High-Technologies Corporation
InventorsRyo Nakagaki, Toshifumi Honda
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AssigneeHitachi High-Technologies Corporation
InventorsRyo Nakagaki, Toshifumi Honda
Estimating the term…
An apparatus for reviewing defects including an image processing section (defect classification device section) with a function of estimating a non-defective state (reference image) of a portion in which the defect exists by use of a defect image, and a function of judging criticality or non-flat state of the defect by use of the estimation result. It becomes possible to establish both of a high-throughput image collecting sequence in which any reference image is not acquired and high-precision defect classification, and then to realize both of a high performance classifying function and a high-throughput image collecting function in a defect reviewing apparatus which automatically collects and classifies images of defects existing on a sample of a semiconductor wafer or the like.
A method of reviewing a defect, comprising the steps of:
A method of reviewing a defect, comprising the steps of:
An apparatus for reviewing a defect on a sample, comprising:
An apparatus for reviewing a defect on a sample, comprising:
Dependencies are inferred from the claim text.