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US 2006/0215272 A1Published application
Objective in a microlithographic projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsToralf Gruner, Hans-Jurgen Mann
Life of this patent
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Abstract
An objective in a microlithographic projection exposure apparatus has a first optical element that has polarization dependent properties causing intensity fluctuations in an image plane of the objective. These fluctuations may be produced by a second optical element that is arranged downstream of the first optical element. A gray filter disposed in the beam path reduces the intensity fluctuations.
Claims12
An objective in a microlithographic projection exposure apparatus, comprising:
- a) a first optical element that has polarization dependent properties causing intensity fluctuations in a plane that is arranged downstream, in a propagation direction of light, of the optical element, and b) a gray filter that reduces the intensity fluctuations.
A microlithographic projection exposure apparatus, having an illumination system and a projection objective, comprising:
- a) an optical element that has polarization dependent properties causing intensity fluctuations in a plane that is arranged downstream, in a light propagation direction, of the optical element, and
- b) a gray filter that reduces the intensity fluctuations.
Dependencies are inferred from the claim text.