Exposure apparatus and exposing method and method of manufacturing a printed wiring board

An exposure apparatus for directly exposing an exposure pattern on a substrate to be exposed without using any of photo masks, said exposure apparatus comprising:

• a stage which moves with the substrate to be exposed placed thereon, the substrate having a photosensitive resin layer with sensitivity to ultraviolet radiation formed thereon;
• a first light source for emitting light containing a wavelength component in the wavelength range of 300 to 410 nm;
• a first light irradiation optical system for modulating a radiant flux emitted from said first light source based on data of a desired exposure pattern to image a pattern on said photosensitive resin layer located on said stage;
• a second light source for emitting light containing a wavelength component in the wavelength range of 2500 to 25,000 nm;
• and
• a second light irradiation optical system for guiding a radiant flux emitted from said second light source to a second light irradiation area that is set so as to include at least a first light irradiation area that is exposed and written by using said first light irradiation optical system.

An exposure apparatus for directly exposing an exposure pattern on a substrate to be exposed without using any of photo masks, said exposure apparatus comprising:

• a stage which moves with the substrate to be exposed placed thereon, the substrate having a photosensitive resin layer with sensitivity to ultraviolet radiation formed thereon;
• a first light source for emitting light containing a wavelength component in the wavelength range of 300 to 410 nm;
• a second light source for emitting light containing a wavelength component in the wavelength range of 450 to 25,000 nm;
• an optical mixing system for optically mixing at least part of a radiant flux emitted from said first light source and at least part of a radiant flux emitted from said second light source;
• and
• a light irradiation optical system for modulating light obtained through the optical mixing by said optical mixing system based on data of a desired exposure pattern to image a pattern on said photosensitive resin layer located on said stage.

An exposure apparatus for directly exposing an exposure pattern on a substrate to be exposed without using any of photo masks, said exposure apparatus comprising:

• a stage which moves with the substrate to be exposed placed thereon, the substrate having a photosensitive resin layer with sensitivity to ultraviolet radiation formed thereon;
• a first light source for emitting light containing a wavelength component in the wavelength range of 300 to 410 nm;
• a first light modulation optical system for modulating a radiant flux emitted from said first light source based on data of a desired exposure pattern;
• a second light source for emitting light containing a wavelength component in the wavelength range of 450 to 25,000 nm;
• a second light modulation optical system for modulating a radiant flux emitted from said second light source based on data of a desired exposure pattern;
• and
• a light irradiation optical system for optically mixing said radiant flux emitted from said first light modulation optical system and said radiant flux emitted from said second light modulation optical system to image a pattern on said photosensitive resin layer located on said stage.